The aim of the project is not only to introduce and research mask-free lithography methods, but also to establish a stable scientific and educational infrastructure in Ukraine capable of supporting research and training young specialists in this field. Therefore, educational, scientific, organizational, and communication activities in this area are being implemented as part of the project.
The new technical capabilities created within the framework of the project will strengthen the integration of research into the educational process, provide students and graduate students with access to modern technologies, and involve them in practical experiments. In addition, we pay considerable attention to expanding scientific cooperation — from holding specialized workshops and thematic sessions at conferences to joint research on materials and tasks of interested institutions and individual scientists.
The equipment, which is being delivered in stages as part of the project, is actively used during training practices and excursions for university students, which are held at the V. E. Lashkaryov Institute of Semiconductor Physics of the National Academy of Sciences of Ukraine several times a year.
2024–2025 academic year: A block entitled “Interaction of laser radiation with matter and physical fundamentals of maskless laser photolithography” has been added to the elective course “Optical spectroscopy of semiconductors and nanostructures” (third year, fifth semester, lecturer — V.Dzhagan).
2025–2026: A separate elective course on semiconductor device manufacturing technology (clean rooms, thin film deposition, crystal growth, traditional and maskless lithography) is being developed. The course will include lectures and practical classes using the project’s equipment and is scheduled to launch in 2026–2027.
In May 2025, as part of the 10th Ukrainian Scientific Conference on Semiconductor Physics (UNKFN-10), a thematic session dedicated to laser and probe lithography was held. The session presented the results obtained within the project and emphasized the relevance of maskless technologies for modern micro- and optoelectronics.
A separate collection of abstracts from this thematic session, which also contains brief information about the project, can be downloaded at the link.
A report was presented at the meeting of the Presidium of the National Academy of Sciences of Ukraine on October 23, 2024.
A workshop entitled “Workshop on Direct Optical Lithography for Advanced Opto- and Microelectronics” was also organized on November 6, 2024, and a workshop entitled “Workshop on Laser processing of materials for advanced optoelectronic applications” was organized on November 6, 2025 (Details —https://www.spo.optics.org.ua/lithography_workshop/)