- Substrate heating increases the uniformity of laser processing, reducing the power density required while maintaining the same effect, and minimizing thermal stresses between the heated film and the cooler substrate, as well as the corresponding effects (cracking, delamination, curling, etc.).
- Processing at low power density can assist in surface cleaning (removal of adsorbed layers, oxides, etc.).
- Processing at power density of (0.5–0.9)×105 W/cm2 and substrate temperature of 150°C promotes the crystallization of the amorphous film with the formation of a nanograin structure with sizes of 50–100 nm and 150–300 nm, respectively.
- At a power density of ~105 W/cm2 , microdroplets of VOx with sizes of 1–2 µm are formed, exhibiting strong longitudinal texture influenced by the substrate relief. The height of the droplets is 120-180 nm.
- Raman spectroscopy confirmed laser-induced crystallization of amorphous vanadium oxide with the formation of certain polytypes depending on laser power density and substrate temperature.
- Laser annealing at room temperature resulted mainly in the crystallization V2O5 phase.
- Combined influence of substrate heating of 150°C and high power density of (1.3-1.8)×105 W/cm2 allowed for the formation of VO2(М2) crystalline phase, while mixture of VO2 та V2O5 phases was formed at moderate power density of (0,5-1,3)×105 W/cm2.
